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NEW Layout BEAMER Version 4
Layout BEAMER V4 offers more:
- Functionality
- Performance and Automation
- Easy to use
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NEW Layout LAB Version 3 & LAB Pro Version 1
Layout LAB V3: 3D Proximity Lithography Simulation
The new version of Layout LAB, the 3D simulation software for optical lithography using mask aligneror other proximity exposure tools offers:
- More accurate modeling
- More flexible evaluation
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New BEAMER Version 4.3.0
What's new:
- Multipass exposure support
- "Undersize / Overdose" contrast enhancement
- New Region Extract options
- Advanced view of overlay / overlap
Read More>>
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