GenISys GmbH joins the eBeam Initiative roster to accelerate
the adoption of design for e-beam technology
Visit booth #25 at MNE2009 in Gent - Belgium
Visit booth #29 at EIPBN 2009 in Marco Island - Florida
Visit us at PMJ 2009 in Yokohama at our Booth
GenISys Supplies Layout BEAMER E-Beam Lithography
Software to Caltech and Two U.S. National Laboratories
GENISYS BUILDS "POWER TEAM" IN ADVANCED PROCESS
MODELING & CORRECTION FOR E-BEAM & MASK ALIGNER LITHO
Advanced correction for sub-50nm e-beam lithography
GENISYS EXPANDS GLOBAL REACH WITH NEW TOKYO OFFICE SERVING JAPAN AND ASIA-PACIFIC MARKETS
EV Group (EVG) and GenISys form ongoing development collaboration on advanced mask aligner lithography simulation for MEMS
GENISYS ANNOUNCES LAYOUT LAB SIMULATION SOFTWARE
ENABLING DESIGN FOR MANUFACTURE FOR MEMS (DfMM)
GENISYS ANNOUNCES ENHANCED LAYOUT BEAMER, GIVING USERS THE BEST CHOICE FOR DIRECT WRITE E-BEAM DATA PREP & PEC
Strong partnership for optical lithography simulation in Europe.
GenISys announced it’s new development of a simulation software for lithography processes with mask aligners (proximity printing).
GenISys announced the new E-Beam Data-Preparation & Proximity Effect correction solution Layout BEAMER.
