GenISys will attend to Photomask Japan conference and exhibition 2009 in Yokohama, Japan. Visit us at our exhibition booth.

The new version of Layout BEAMER will be in the focus of the exhibition

Major enhancements of Layout BEAMER Version 3.3 are:

- 3-D PEC

- Advanced Process Correction

- Correction by shape (geometry) modulation as alternative to dose modulation

We will also demonstrate the new version of the proximity lithography (mask-aligner) simulation software Layout LAB. Major enhancements of Layout LAB Version 2.3 are

- 3-D topography on the wafer

- Enhancemet of visualization and metrology of 3D resist profile

Meet us in Yokohama to get hands-on experience with our products, discuss your needs and application.