GenISys will attend to EIPBN and exhibition. Visit us at our exhibition booth #29.

The new version of Layout BEAMER will be in the focus of the exhibition.

Major enhancements of Layout BEAMER Version 3.3 are:

- 3-D PEC

- Advanced Process Correction

- Correction by shape (geometry) modulation as alternative to dose modulation

We will also demonstrate the new version of the proximity lithography (mask-aligner) simulation software Layout LAB. Major enhancements of Layout LAB Version 2.3 are

- 3-D topography on the wafer

- Modelling of resist bleaching

- Enhancemet of visualization and metrology of 3D resist profile

Meet us in Floridato get hands-on experience with our products, discuss your needs and application.