GenISys will attend to the MNE conference and exhibition. Visit us at our exhibition booth #25.

The new version of Layout BEAMER will be in the focus of the exhibition.

Major enhancements of Layout BEAMER Version 3.4 are:

- Major speed-up of short and mid rage correction

- Enhancement of e-beam simulation in accuracy, speed and usability

- Faster processing by hierarchy and parallel processing

- ......

We will also demonstrate the new version of the proximity lithography (mask-aligner) simulation software Layout LAB. Major enhancements of Layout LAB Version 2.3 are

- 3-D topography on the wafer

- Modelling of resist bleaching

- Enhancemet of visualization and metrology of 3D resist profile

We will announce layout editor capability in co-operation with Juspertor.

Meet us in Gent and get hands-on experience with our products, discuss your needs and application.