GenISys offers fast and flexible support for integration, customization and development of needed functions.
Fast Layout Data Preparation & Proximity Effect Correction for Direct Write
The preparation of large layout data for e-beam direct write requires a highly efficient, flexible and robust framework for design and execution of complex processes including layout handling, processing, PEC, process modeling & correction, inspection and conversion to the machine format.
Layout BEAMER is a highly intuitive, process flow driven layout processing solution:
Layout BEAMER provides a new innovative GUI framework for the database driven, modular design of complex data-prep process flows. It allows defining /saving of process flows as customer defined modules, to be used in other hierachical process flows. The Layout BEAMER combines performance, flexibility and intuitive usage for demanding tasks in direct write.
STRONG FEATURES
VisualFLOW™ platform for “click-and-go” handling of custom process flows
Enables modular design of complex hierarchical process flows
High performance data handling and processing
Superior Proximity Effect Correction providing best CD control on curved and manhattan structures
Process modeling / simulation for verification and optimization
