GenISys is providing a dedicated strong technical support for the aBeam products in Europe.
aBeam Technologies is a company with expertise in microelectronic technology, software development, and optics. Products of aBeam cover advanced modeling of lithographic and etch processes and metrology. The products of aBeam and GenISys are complementary to each other. GenIsys is the distributor for aBeam products in Europe. aBeam is the distributor for GenISys products in USA.
CHARIOT: Advanced Monte Carlo software to predict signal and images in scanning electron microscopy (SEM) and the absorbed dose in electron beam lithography. CHARIOT calculates the energy deposition depending on acceleration energy and layers. The result can be used as a parameter for proximity effect correction with Layout BEAMER. CHARIOT predicts image formation in CD-SEM and e-beam defect inspection.
CHARIOT employs user friendly fully 3D graphical user interface and uses
advanced physical models of electron scattering, generation of fast and slow secondary electronss, and their propagation in materials
emphasis on low voltage electrorns
3D multilayered patterned target
target charging
electron trajectories in electrical fields
detector geometry, location and energy transfer function
TEMPTATION: Temperature simulation software for modeling of temperature rise in electron beam lithography (EBL) and its influence on variation of critical dimensions (CD). TEMPTATION uses an advanced analytic model which takes into account all target layers. Millions of shaped-beam flashes can be simulated. The TEMPTATION software allows for prediction of CD-variation due to resist heating; it was experimentally verified. The software can reduce development costs of new technology, or new EBL system.
TRAVIT : Microloading and macroloading effects in dry etch contribute significantly to variation of critical dimension across the photomask or a wafer.
Simulating a dry etching process is a complex problem that requires a detailed knowledge of plasma physics, the interaction of plasmas with solids, plasma chemistry, kinetics, etc. Because of this complexity, there is no commercial software tool available to the industry. TRAVIT is a software tool that is focused on simulation of CDs and CD variations; these are not being addressed by currently known models. An analytic model is used to simulate the dynamics of etch profiles. The simulation can handle isotropic etch, anisotropic etch, and a combination of the two. Using etched profiles found by the software, it then extracts CD’s and calculates CD-variation.
BEAMETR: Automatic measurement of e-beam size. A specially fabricated nano-pattern and software are supplied. The pattern is scanned by e-beam; the software analyzes the image in frequency domain and determines beam sizes in x and y directions.
Measure your beam diameter – instantly!
Contact GenISys to learn more about aBeam products and discuss your needs for advanced e-beam modelling.
