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Publications

Apr 12 2017
High resolution and high density nano-patterning in HSQ using proximity correction
Devin K. Brown, Ezra Kim, Caitlin Chapin, Gerald Lopez, Nezih Unal, Ulrich Hofmann
International Conference on Micro and Nano Engineering (MNE), Berlin, 2011

 

Apr 12 2017
Third Dimension of Proximity Effect Correction (PEC)
A. Schleunitz and H. Schift
J. Micromech. Microeng. 20 (2010) 095002; DOI:10. 1088/0960-1317/20/9/095002  

Apr 12 2017
Modeling and correction of lateral resist development effects in 3-D ebeam lithography

Apr 12 2017
Enhancing 3-D structural variety by combination of electron-beam and nanoimprint lithography with thermal reflow
A. Schleunitz, V. Guzenko, C. Spreu, M. Vogler, H. Atasoy, G. Gruetzner and H. Schift.
37th International Conference on Micro- and Nano-Engineering (MNE2011), Berlin, Germany, September 19-23, 2011, P-LITH-071
(Best Poster Award Winner in category Lithography and Systems)

Nov 19 2013
LAB

Nov 19 2013
BEAMER

Jul 22 2013
Progress and issues in e-beam and other top down nanolithography
Nezih Unal, Diana Mahlu, Olga Raslin, Daniel Ritter, Christoph Sambale, Ulrich Hofmann
International Conference on Micro and Nono Engineering (MNE) 2009

Jan 21 2012
Duplikat von Simulation for Advanced Mask Aligner Lithography
Ulrich Hofmann, Daniel Ritter, Balint Meliorisz, Nezih Ünal, GenISys GmbH
Michael Hornung, Ralph Zoberbier, SUSS MicroTec Lithography
Published in "SUSS Report 01/2012"

Jan 21 2012
Duplikat von Advanced Mask Aligner Lithography (AMALITH)
Reinhard Völkl, Uwe Vogler, Arianna Bramati, Tina Weichelt, SUSS MicroOptics SA, Neuchatel
Ulrich Hofmann, Nezih Ünal, GenISys GmbH, Germany
Published in "SUSS Report 01/2012"

Nov 21 2011
Modeling and Correction of process effects in (2D / 3D) e-Beam Lithography
U. Hofmann, N. Unal
Beams&More Conference, Stuttgart, 2011

Oct 22 2011
Selective profile transformation of electron-beam exposed multilevel resist structures based on a molecular weight dependent thermal reflow
A. Schleunitz, V.A. Guzenko, A. Schander, M. Vogler and H. Schift
J. Vac. Sci. Technol. B29(6) (2011) 06F302; DOI: 10. 1016/j.mee.2010.12.046 (4pp)

Oct 21 2011
Duplikat von Modeling photoresist development and optimizing resist profiles for mask aligner lithography
K. Motzek, S. Partel
9th IISB Lithography Simulation Workshop 2011

Sep 22 2011
Benchmark of Monte Carlo Simulation for high Resolution Electron Beam Lithography
Karl E. Hoffmann, Marcus Rommel, Thomas Reindl, Jürgen Weis, Nezih Unal, Ulrich Hofmann
International Conference on Micro and Nano Engineering (MNE), Berlin, 2011  

Sep 22 2011
Duplikat von Fabrication process development for a high sensitive electrochemical IDA sensor
S. Partel, M. Mayer, P. Hudek, C. Dincer, J. Kieninger, G.Urban, K. Motzek, L. Matay
MNE 2011, Berlin

Sep 21 2011
Duplikat von Mask Aligner Lithography Simulation - From Lithography Simulation to Process Validation
K.Motzek, A. Erdmann, U.Hofmann, N.Ünal, M.Hennemeyer, M.Hornung, P.Hudek, S.Partel, A Heindl, M. Ruhland,
Conference on Micro and Nano Engineering (MNE) Berlin 2011

Aug 21 2011
Duplikat von Computational algorithms for optimizing mask layouts in proximity printing
K. Motzek, U. Vogler, M. Hennemeyer, M. Hornung, R. Voelkel, A. Erdmann, B. Meliorisz
Microelectronic Engineering, Volume 88, Issues 8, August 2011, Pages 2066-2069

Feb 22 2011
Duplikat von Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing
K. Motzek, S. Partel, U. Vogler, A. Erdmann
Proc. SPIE 8171, 81710K (2011)

Feb 21 2011
Duplikat von Simulation Tools for Advanced Mask Aligner
A.Bramati, U. Vogler, B.Meliorisz, K. Motzek, M. Hornung, R. Voelkel
Proc. SPIE 8167, 81670U (2011)

Nov 21 2010
Customized illumination for process window optimization and yield improvement

Oct 22 2010
Duplikat von Optical Proximity Correction and Source Mask Optimization for Mask Aligner Lithography
K. Motzek, U. Vogler, A. Erdmann
Fraunhofer IISB Lithography Simulation Workshop, 2010, Hersbruck

Sep 23 2010
Duplikat von Advanced mask aligner lithography: new illumination system
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K.J. Weible, M. Hornung, R. Zoberbier, E. ullmann, L. Stuerzeecher, T. Harzendorf, U.D. Zeitner
Optics Express, Vol. 18, Issue 20, pp. 20968-20978 (2010)

Sep 23 2010
Duplikat von A Novel Illumination System for Mask Aligners Allows Advanced Lithography Techniques
M. Hornung, R. Zoberbier, U. Vogler, R. Voelkel
MNE2010, Genua

Sep 22 2010
Fabrication of 3-D nanoimprint stamps with continuous reliefs using dose-modulated electron beam lithography and thermal reflow
A. Schleunitz and H. Schift
J. Micromech. Microeng. 20 (2010) 095002; DOI:10. 1088/0960-1317/20/9/095002  

Aug 21 2010
Duplikat von Optimization of illumination pupils and mask structures for proximity printing
K. Motzek, A. Bich, A. Erdmann, M. Hornung, M. Hennemeyer, B. Meliorisz, U. Hofmann, N. Ünal, R. Voelkel, S. Partel, P. Hudek
Microelectronic Engineering, Volume 87, Issues 5-8, May-August 2010, Pages 1164-1167

Nov 07 2009
Advanced Modeling & Correction for E-beam Lithography Proximity and Process Effects
Ulrich Hofmann
Beams & More Conference, Stuttgart 2009

Sep 24 2009
Improved CD control and line edge roughness in E-beam lithography through combining proximity effect correction with gray scale techniques

Sep 22 2009
3rd dimension of PEC
Nezih Unal, Diana Mahlu, Olga Raslin, Daniel Ritter, Christoph Sambale, Ulrich Hofmann
International Conference on Micro and Nono Engineering (MNE) 2009

Sep 21 2009
Easy to adapt electron beam lithography PEC calibration based on visual inspection of a "Best Dose Sensor"
Nezih Unal, Martin D.B. Charlton, Ulrike Waizmann, Thomas Reindl, Ulrich Hofmann
International Conference on Micro and Nano Engineering (MNE) 2009

Sep 21 2009
Duplikat von 3D Topography Effects in Mask Aligner Lithography
B. Meliorisz, H. Lerch (AMO), D. Ritter
7th IISB Lithography Simulation Workshop, September 2009, Hersbruck

Sep 21 2008
Duplikat von Mask aligner lithography simulation for layout verification and optimization using OPC methodology
H. Lerch, B. Meliorisz, D. Ritter
6th IISB Lithography Simulation Workshop, September 2008, Athens