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LAB

Jan 21 2013
3D Topography Mask Aligner Lithography Simulation
Ulrich Hofmann, Nezih Ünal, GenISys GmbH, Germany
Ralph Zoberbier, SUSS MicroTec Lithography, Germany
Ton Nellissen, Philips Research, Netherlands

Published in "SUSS Report 01/2013"

Jan 21 2012
Simulation for Advanced Mask Aligner Lithography
Ulrich Hofmann, Daniel Ritter, Balint Meliorisz, Nezih Ünal, GenISys GmbH
Michael Hornung, Ralph Zoberbier, SUSS MicroTec Lithography
Published in "SUSS Report 01/2012"

Jan 21 2012
Advanced Mask Aligner Lithography (AMALITH)
Reinhard Völkl, Uwe Vogler, Arianna Bramati, Tina Weichelt, SUSS MicroOptics SA, Neuchatel
Ulrich Hofmann, Nezih Ünal, GenISys GmbH, Germany
Published in "SUSS Report 01/2012"

Oct 21 2011
Modeling photoresist development and optimizing resist profiles for mask aligner lithography
K. Motzek, S. Partel
9th IISB Lithography Simulation Workshop 2011

Sep 22 2011
Fabrication process development for a high sensitive electrochemical IDA sensor
S. Partel, M. Mayer, P. Hudek, C. Dincer, J. Kieninger, G.Urban, K. Motzek, L. Matay
MNE 2011, Berlin

Sep 21 2011
Mask Aligner Lithography Simulation - From Lithography Simulation to Process Validation
K.Motzek, A. Erdmann, U.Hofmann, N.Ünal, M.Hennemeyer, M.Hornung, P.Hudek, S.Partel, A Heindl, M. Ruhland,
Conference on Micro and Nano Engineering (MNE) Berlin 2011

Aug 21 2011
Computational algorithms for optimizing mask layouts in proximity printing
K. Motzek, U. Vogler, M. Hennemeyer, M. Hornung, R. Voelkel, A. Erdmann, B. Meliorisz
Microelectronic Engineering, Volume 88, Issues 8, August 2011, Pages 2066-2069

Feb 22 2011
Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing
K. Motzek, S. Partel, U. Vogler, A. Erdmann
Proc. SPIE 8171, 81710K (2011)

Feb 21 2011
Simulation Tools for Advanced Mask Aligner
A.Bramati, U. Vogler, B.Meliorisz, K. Motzek, M. Hornung, R. Voelkel
Proc. SPIE 8167, 81670U (2011)

Nov 21 2010
Customized illumination for process window optimization and yield improvement
M. Hornung, U. Vogler, R. Voelkel
J. Vac. Sci. Technol. B28, C6Q6 (2010)

Oct 22 2010
Optical Proximity Correction and Source Mask Optimization for Mask Aligner Lithography
K. Motzek, U. Vogler, A. Erdmann
Fraunhofer IISB Lithography Simulation Workshop, 2010, Hersbruck

Sep 23 2010
Advanced mask aligner lithography: new illumination system
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K.J. Weible, M. Hornung, R. Zoberbier, E. ullmann, L. Stuerzeecher, T. Harzendorf, U.D. Zeitner
Optics Express, Vol. 18, Issue 20, pp. 20968-20978 (2010)

Sep 23 2010
A Novel Illumination System for Mask Aligners Allows Advanced Lithography Techniques
M. Hornung, R. Zoberbier, U. Vogler, R. Voelkel
MNE2010, Genua

Aug 21 2010
Optimization of illumination pupils and mask structures for proximity printing
K. Motzek, A. Bich, A. Erdmann, M. Hornung, M. Hennemeyer, B. Meliorisz, U. Hofmann, N. Ünal, R. Voelkel, S. Partel, P. Hudek
Microelectronic Engineering, Volume 87, Issues 5-8, May-August 2010, Pages 1164-1167

Sep 21 2009
3D Topography Effects in Mask Aligner Lithography
B. Meliorisz, H. Lerch (AMO), D. Ritter
7th IISB Lithography Simulation Workshop, September 2009, Hersbruck

Sep 21 2008
Mask aligner lithography simulation for layout verification and optimization using OPC methodology
H. Lerch, B. Meliorisz, D. Ritter
6th IISB Lithography Simulation Workshop, September 2008, Athens