GenISys offers fast and flexible support for integration, customization and development of needed functions.
Simulation for advanced Mask Aligner Lithography processes
Mask Aligner Lithography (proximity printing) is widely used for producing MEMS, optical and electronic devices because of cost efficiency. The increase of complexity and miniaturization is pushing equipment and processes to the physical limits. Simulation provides a powerful tool for development and optimization for saving development time, cost and optimizing yield.
The Layout LAB is a “VIRTUAL PLATFORM” for optimization of micro-patterning processes:
The Layout LAB provides an easy to use software platform for the modelling of typical MEMS manufacturing processes. It includes precise simulation of the lithography process with mask-aligner and resist process to model the result on the substrate. The Layout LAB shortens development cycles and saves cost by verification and optimization of the final printed results without producing masks and running experiments in a real process line.
STRONG FEATURES
VisualFLOW™ platform for “click-and-go” handling of custom process flows
Accurate simulation kernel for mask-aligner lithography and resist process
Fast 3-D visualization, verification and optimization functions
